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Hafnium (Hf) Sputtering Targets
Step into the next era of microelectronics with our high-purity Hafnium (Hf) sputtering targets. Hafnium is the material of choice for fabricating high-k dielectric films, which are essential for reducing power consumption and gate leakage in advanced semiconductor fabrication and CMOS technology. We deliver high-density targets with precisely controlled Zirconium (Zr) content and purities up to , ensuring the stable deposition rate and superior film quality required for next-generation integrated circuits and advanced optical coatings.
Experience Unmatched Quality and Performance
Key Features of Hafnium (Hf) Sputtering Targets
High-K Dielectric Leader
The definitive material for films, critical for next-generation semiconductors and low-power transistors.
Low Zirconium Content
Precision targets engineered with minimal Zirconium (Zr) to guarantee the best electrical performance and film purity.
Optics and Protection
Used to produce durable, high-refractive-index films for demanding optical coatings and wear-resistant layers.
Technical Information
| Purity | Melting Point | Hardness | Yield Strength/Tensile | Available Geometries | Backing Plate Options |
|
99.95% with Zr< 0.5% |
2,233 °C | 5.5 | 485MPa | Planar |
|
About Our Hafnium (Hf) Sputtering Targets
For reliable high-volume production, choose our premium Hafnium sputtering targets. With a high melting point of and exceptional process stability, our targets reduce defects and particle generation. We provide custom planar and rotary solutions tailored to fit your specific PVD equipment, ensuring consistent performance for all your electronics and advanced coating needs.
Our Specialized Services
Comprehensive Solutions for Your Needs
Indium Bonding
Our expert indium bonding service ensures optimal thermal and electrical conductivity for your sputtering targets, enhancing performance and longevity.
Custom Configurations
We offer tailored configurations to meet the specific requirements of your application, ensuring seamless integration and maximum efficiency.
Multi-Tile Assemblies
Our multi-tile assemblies are designed for both planar and rotary applications, providing versatility and adaptability for complex projects.
Rotary Target Manufacturing
Specializing in rotary target manufacturing, we deliver precision-engineered solutions that meet the highest industry standards.
Planar Target Solutions
Our planar target solutions are crafted with precision to support a wide range of thin film applications, ensuring superior performance.
Evaporative Materials
We supply high-quality evaporative materials that are essential for efficient thin film deposition processes across various industries.
Backing Plates and Tubes
Our durable backing plates and tubes are designed to support your sputtering targets, ensuring stability and reliability during operations.
Transparent Conductive Oxides
We develop advanced transparent conductive oxides like AZO and GZO, tailored for photovoltaic and display applications.
Get in Touch Today
Contact us to learn more about our high-quality Hafnium (Hf) sputtering targets and how we can support your specific application needs. Request a quote today!