Precision Hafnium Sputtering Targets (Hf) for High-K Dielectrics
Step into the next era of microelectronics with our high-purity hafnium sputtering targets. As the industry standard, Hafnium is the definitive low-zirconium Hf deposition material for fabricating high-K dielectric films. The reason is simple: these films are essential for reducing power consumption and gate leakage in advanced CMOS transistors. We deliver high-density targets with purities up to 99.99%, ensuring the stable deposition rate and superior film quality required for next-generation integrated circuits and advanced coating applications.
Experience Unmatched Quality and Performance
The Leading Supplier in Hafnium High-K Dielectric
Since replacing Silicon Dioxide (SiO) at the 45nm technology node, Hafnium-based films have driven semiconductor scaling.
Critical Gate Oxide
First, HfO2 is the definitive HfO2 CMOS gate oxide source. It provides the high dielectric constant required to increase gate capacitance while maintaining a physically thicker layer, thereby suppressing quantum tunneling and leakage current.
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Low Zirconium Purity
Crucially, we specialize in ultra-low Zr content Hf target material. Because Zirconium (Zr) is chemically similar to Hafnium, it is difficult to separate. However, uncontrolled Zr content degrades the electrical performance of the high-K film. Our precision targets are engineered with minimal Zr content to guarantee the best gate oxide quality.
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Ferroelectric Memory (FRAM)
Furthermore, Hafnium is vital for emerging memory technology. Specifically, HZO sputtering target source materials (Hafnium Zirconium Oxide) are key to creating the ferroelectric thin films used in next-generation non-volatile FRAM devices.
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Technical Information
| Purity | Melting Point | Hardness | Yield Strength/Tensile | Available Geometries | Backing Plate Options |
|
99.95% with Zr< 0.5% |
2,233 °C | 5.5 | 485MPa | Planar |
|
Hafnium Oxide Optical Coating and Specialized Services
Beyond microelectronics, HfO2 is highly valued for its performance in optical coatings and protective layers.
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High-Refractive Index Optics: Hafnium oxide optical coating films exhibit a high refractive index and excellent transparency over a broad spectrum. As a result, they are ideal for use as durable, high-performance layers in anti-reflective coatings and complex optical assemblies. (Referenced:
Surface Morphology and Optical Properties of Hafnium Oxide Thin Films Produced by Magnetron Sputtering
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Manufacturing Assurance: For reliable, high-volume production, we provide custom planar and rotary solutions. Moreover, our specialized Indium Bonding service ensures optimal thermal management, preventing target overheating and particle generation, which is crucial for maintaining the required film uniformity.
Custom Planar and Rotatable Targets
We offer fully customized solutions. Our expertise allows us to manufacture Custom Planar and Rotatable Targets in various sizes and assemblies. This includes Large Area Deposition Targets designed to optimize material usage and system throughput for both R&D and mass production.
Precious Metal Repress & Reclaim Services
Your investment in Platinum Group Metal Targets is protected by our material services. Our Precious Metal Sputtering program includes comprehensive reclaim and reprocessing to help you recover high-value Sputtering Target Material, minimizing waste and reducing your total cost of ownership.
Get Started with High-Purity Hafnium
Contact us to learn more about how our high-quality Hafnium Sputtering Targets can support your specific microelectronics application needs. Request a quote today!