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Iridium (Ir) Sputtering Targets
For applications demanding the ultimate in stability and corrosion resistance, choose our high-purity Iridium (Ir) sputtering targets. As a platinum group metal with the highest known corrosion resistance and an exceptional melting point of , Iridium is indispensable for creating robust thin-film electrodes in next-generation DRAM/FRAM memory devices and high-reliability electrocatalysts. We supply ultra-dense targets that minimize arcing and ensure exceptional film uniformity for your most critical aerospace and electronics manufacturing processes.
Experience Unmatched Quality and Performance
Key Features of Our Iridium (Ir) Sputtering Targets
Unmatched Stability
Offers the highest corrosion resistance of any metal and a high melting point for extreme environments.
Advanced Electronics
Essential material for thin-film electrodes and barrier layers in advanced memory (DRAM, FRAM) and semiconductor devices.
Catalytic & Optical Use
Ideal for high-performance electrocatalysis (Iridium Oxide) and fine-grain coatings for high-resolution imaging.
Technical Information
| Purity | Melting Point | Hardness | Yield Strength/Tensile | Available Geometries | Backing Plate Options |
| 99%-99.95% | 1,907°C | 8.5 | 20-154MPa |
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Planar:
Rotatable:
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About Our Iridium (Ir) Sputtering Targets
Ensure your films are flawless using our premium Iridium sputtering targets. Our stringent quality control and high-density material preparation are designed to maximize target utilization and minimize particle defects, which is crucial for sensitive high-resolution and thin-film memory applications. Contact us for custom planar and rotary targets tailored to your system
Our Specialized Services
Comprehensive Solutions for Your Needs
Indium Bonding
Our expert indium bonding service ensures optimal thermal and electrical conductivity for your sputtering targets, enhancing performance and longevity.
Custom Configurations
We offer tailored configurations to meet the specific requirements of your application, ensuring seamless integration and maximum efficiency.
Multi-Tile Assemblies
Our multi-tile assemblies are designed for both planar and rotary applications, providing versatility and adaptability for complex projects.
Rotary Target Manufacturing
Specializing in rotary target manufacturing, we deliver precision-engineered solutions that meet the highest industry standards.
Planar Target Solutions
Our planar target solutions are crafted with precision to support a wide range of thin film applications, ensuring superior performance.
Evaporative Materials
We supply high-quality evaporative materials that are essential for efficient thin film deposition processes across various industries.
Backing Plates and Tubes
Our durable backing plates and tubes are designed to support your sputtering targets, ensuring stability and reliability during operations.
Transparent Conductive Oxides
We develop advanced transparent conductive oxides like AZO and GZO, tailored for photovoltaic and display applications.
Get in Touch Today
Contact us to learn more about our high-quality Iridium (Ir) sputtering targets and how we can support your specific application needs. Request a quote today!