Ultra-High Purity Niobium Sputtering Targets (Nb) for Superconducting & Quantum Applications
Unlock the potential of your deposition process with premium niobium sputtering targets. As the foundational material for superconducting technology, Niobium (Nb) has the highest critical temperature (Tc) among elemental superconductors. Therefore, we provide ultra-high purity Nb deposition material (up to 99.999%) featuring controlled grain size and high density. The result is exceptional film uniformity, stability, and an extended target lifespan, essential for the most sensitive applications in physics and electronics.
Experience Unmatched Quality and Performance
Key Applications in High-Performance Niobium Thin Films
Our niobium sputtering targets and compounds are critical to several high-value sectors:
Superconductivity and Quantum Computing
First and foremost, pure Niobium is used to create niobium thin film superconductor layers. Specifically, these films are integral to fabricating Superconducting Radio Frequency (SRF) cavities for particle accelerators, superconducting quantum interference devices (SQUIDs), and superconducting qubit PVD material for quantum processors.
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Advanced Optical Coatings Nb2O5
Furthermore, reactive sputtering of Niobium targets produces Nb2O5 (Niobium Pentoxide), a high-quality niobium oxide optical coating. Due to its high refractive index (~2.4), low extinction coefficient, and wide band gap, it is used in interference filters, waveguides, and as an Electron Transport Layer (ETL) in next-generation solar cells.
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Semiconductor Diffusion Barriers (NbN)
Finally, Niobium Nitride (NbN) is an advanced niobium nitride diffusion barrier material. It is used in Cu metallization for integrated circuits, offering robust protection against copper diffusion and high electrical conductivity, performing favorably against traditional TaN barriers.
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Technical Information
| Purity | Melting Point | Hardness | Yield Strength/Tensile | Available Geometries | Backing Plate Options |
| 99.95% | 2,477°C | 6 | 125-275MPa |
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Rotatable:
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Manufacturing Excellence for High-Reliability Niobium Targets
Leverage our high-performance niobium sputtering targets for your demanding research and manufacturing needs. We guarantee consistent material flow and superior film quality, essential for high-volume production in semiconductor fabrication and sensitive electronics.
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Purity Control: Ultra-high purity Nb deposition material is processed to minimize contaminants that can degrade superconducting properties.
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Indium Bonding: Our expert Indium Bonding ensures optimal thermal and electrical conductivity, which is vital for maximizing the lifespan and stability of the target in long-duration runs.
Custom Planar and Rotatable Targets
We offer fully customized solutions. Our expertise allows us to manufacture Custom Planar and Rotatable Targets in various sizes and assemblies. This includes Large Area Deposition Targets designed to optimize material usage and system throughput for both R&D and mass production.
Precious Metal Repress & Reclaim Services
Your investment in Platinum Group Metal Targets is protected by our material services. Our Precious Metal Sputtering program includes comprehensive reclaim and reprocessing to help you recover high-value Sputtering Target Material, minimizing waste and reducing your total cost of ownership.
Get Started with High-Purity Niobium
Contact us to learn more about how our high-quality Niobium Sputtering Targets can support your specific microelectronics application needs. Request a quote today!