Home » Solutions » Services » Vacuum Hot Press Services » Pressureless Sintering
Pressureless Sintering
Pressureless Sintering is a cost-effective, high-temperature thermal process essential for creating dense, robust metallic and ceramic components, particularly for modern manufacturing like 3D printed parts. By leveraging heat (up to
Experience Unmatched Quality and Performance
Key Features of Our Reclaim & Recycling Processes
Heat-Driven Atomic Diffusion
Uses heat to drive atomic diffusion for forming complex metallic and ceramic parts without external pressure.
Near-Net-Shape Production
Ideal for creating near-net-shape parts, especially for 3D-printed components, while maintaining the desired porosity.
Versatile Sintering Atmospheres
Capable of sintering in vacuum or inert gases (N2, O2) with customizable parameters up to 1620°C.
About Our Pressureless Sintering Service
Achieve high-density, complex components with our controlled pressureless sintering services. Ideal for 3D printed parts requiring precise porosity or near-net-shape finalization, our process utilizes high-temperature kilns (up to ) in custom atmospheres (vacuum, , ) to ensure superior material properties through heat-driven atomic diffusion. Contact us to discuss your specific de-binding and sintering parameters.
Our Specialized Services
Comprehensive Solutions for Your Needs
Indium Bonding
Our expert indium bonding service ensures optimal thermal and electrical conductivity for your sputtering targets, enhancing performance and longevity.
Custom Configurations
We offer tailored configurations to meet the specific requirements of your application, ensuring seamless integration and maximum efficiency.
Multi-Tile Assemblies
Our multi-tile assemblies are designed for both planar and rotary applications, providing versatility and adaptability for complex projects.
Rotary Target Manufacturing
Specializing in rotary target manufacturing, we deliver precision-engineered solutions that meet the highest industry standards.
Planar Target Solutions
Our planar target solutions are crafted with precision to support a wide range of thin film applications, ensuring superior performance.
Evaporative Materials
We supply high-quality evaporative materials that are essential for efficient thin film deposition processes across various industries.
Backing Plates and Tubes
Our durable backing plates and tubes are designed to support your sputtering targets, ensuring stability and reliability during operations.
Transparent Conductive Oxides
We develop advanced transparent conductive oxides like AZO and GZO, tailored for photovoltaic and display applications.
Get in Touch Today
Contact us to learn more about our high-quality ITO sputtering targets and how we can support your specific application needs. Request a quote today!
