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Virgin Powder Repress
Depending on the target geometry, a spent target can be repressed up to ten times before the noble metal backer would need to be fully reclaimed. This repressing process can lead to cost savings on noble metal powder of up to 50%.
Experience Unmatched Quality and Performance
Key Features of Our Virgin Powder Repress (VPR) Service
High-Density Target Manufacturing
Our VPR service produces high-density, high-quality sputtering targets utilizing spent target backers in a unique manufacturing process.
Vacuum Hot Press Technology
Applying heat and uniaxial pressure in a vacuum hot press furnace for superior target formation.
Noble Metal Target Production
Our VPR services is specialized in manufacturing noble metal sputtering targets.
About (VPR) Virgin Powder Repress
When sputtering is the preferred coating technique for manufacturing, the high cost of noble-metal powder, combined with the low utilization of planar sputtering targets (15%-30%), makes the target one of the costliest factors within the process. Our process produces a high-density target with an interface between the original target and additional powder that does not inhibit the sputtering process. We have found that, depending on target geometry, a spent target backer can be repressed up to ten times before the noble metal backer would need to be fully reclaimed. This repressing process can lead to cost savings on noble metal powder of up to 50%.
Our Specialized Services
Comprehensive Solutions for Your Needs
Indium Bonding
Our expert indium bonding service ensures optimal thermal and electrical conductivity for your sputtering targets, enhancing performance and longevity.
Custom Configurations
We offer tailored configurations to meet the specific requirements of your application, ensuring seamless integration and maximum efficiency.
Multi-Tile Assemblies
Our multi-tile assemblies are designed for both planar and rotary applications, providing versatility and adaptability for complex projects.
Rotary Target Manufacturing
Specializing in rotary target manufacturing, we deliver precision-engineered solutions that meet the highest industry standards.
Planar Target Solutions
Our planar target solutions are crafted with precision to support a wide range of thin film applications, ensuring superior performance.
Evaporative Materials
We supply high-quality evaporative materials that are essential for efficient thin film deposition processes across various industries.
Backing Plates and Tubes
Our durable backing plates and tubes are designed to support your sputtering targets, ensuring stability and reliability during operations.
Transparent Conductive Oxides
We develop advanced transparent conductive oxides like AZO and GZO, tailored for photovoltaic and display applications.
Get in Touch Today
Contact us to learn more about our high-quality ITO sputtering targets and how we can support your specific application needs. Request a quote today!