High-Purity Zinc Tin Oxide Sputtering Targets (ZTO) for Indium-Free Optoelectronics
Pioneer next-generation optoelectronics with our high-purity zinc tin oxide sputtering targets. As a critical advantage, ZTO is a leading, Indium-free alternative to ITO, making it a highly stable and cost-effective Transparent Conductive Oxide (TCO). Therefore, our targets are indispensable for sustainable manufacturing. We supply targets with custom ZnSnO ratios and purities up to 99.95%. ZTO is the ideal channel material for high-mobility Thin-Film Transistors (TFTs), large-area flat panel displays (OLED/LCD), and high-efficiency solar cells, delivering the perfect balance of electrical conductivity and optical transparency.
Experience Unmatched Quality and Performance
The Indium-Free TCO Targets Revolution
The global electronics market requires solutions that reduce reliance on costly and scarce materials like Indium. Our high-purity ZTO thin-film source is engineered to meet this demand.
High-Mobility TFT Channels
First and foremost, ZTO is the preferred ZTO thin-film transistor channel material, especially for backplane electronics in large-area displays. Compared to traditional amorphous silicon, our oxide TFT channel material achieves significantly higher electron mobility and remains stable during high-temperature annealing.
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TFT & Display Use
Crucially, ZTO acts as a highly effective ZTO transparent electrode in advanced solar cells and displays. By serving as a cost-effective transparent conductive oxide, ZTO helps to reduce manufacturing costs and supply chain risks associated with Indium.
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Flexible and Large-Area Displays
Furthermore, the amorphous nature and inherent mechanical stability of ZTO thin films make them a superior choice for flexible displays and large-area deposition. Research confirms that amorphous ZTO Thin-Film Transistors maintain stable electrical performance even when subjected to significant bending strain (up to 1.26%).
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Technical Information
| Standard Composition | Purity | Hardness | Density | Bandgap | Available Geometries | Backing Plate Options |
| Zn10SnO12 | 99.95% | ~5 |
Observed: 5.69 g/cm³ ÷ Theoretical: 5.81 g/cm³ __________
97.93% |
3.4eV-3.8eV |
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Planar:
Rotatable:
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High-Density ZTO Manufacturing & PVD Optimization
We manufacture ZnSnO sputtering targets with superior control over density and composition.
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Density Assurance: Our oxide targets are sintered to achieve high density (up to 97.93% of theoretical density). This is key because high density ensures minimal particle generation during sputtering, resulting in stable deposition rates and cleaner films for defect-sensitive TFT applications.
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Custom Compositions: We provide the necessary versatility for a custom zinc tin oxide ratio. Since the Zn:Sn ratio dictates the electrical and optical properties of the film, we work closely with customers to provide precise targets tailored for specific device performance.
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Indium Bonding: Our expert Indium Bonding services enhance thermal and electrical conductivity, ensuring optimal target performance and longevity in high-volume production environments.
Custom Planar and Rotatable Targets
We offer fully customized solutions. Our expertise allows us to manufacture Custom Planar and Rotatable Targets in various sizes and assemblies. This includes Large Area Deposition Targets designed to optimize material usage and system throughput for both R&D and mass production.
Precious Metal Repress & Reclaim Services
Your investment in Platinum Group Metal Targets is protected by our material services. Our Precious Metal Sputtering program includes comprehensive reclaim and reprocessing to help you recover high-value Sputtering Target Material, minimizing waste and reducing your total cost of ownership.