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Ceramic & Oxide Sputtering Targets
Our engineered materials serve a vast array of markets. We have decades of experience manufacturing complete sputtering target assemblies for any OEM system our customers have.
Our large rotary sputtering targets mainly serve the large area glass coating sector & thin-film solar markets while our round & rectangular planar targets, evaporation materials, and powders generally support the optical coating & photonics coatings markets. Our support for the Aerospace & Defense market comes from a mixture of our products.
Ceramic & Oxide Sputtering Targets
Explore our comprehensive range of sputtering targets designed to meet the demands of modern technology. From semiconductors to photovoltaics, our materials drive innovation across industries.
Ceramic & Oxide Alloy Sputtering Targets
Explore our comprehensive range of sputtering targets designed to meet the demands of modern technology. From semiconductors to photovoltaics, our materials drive innovation across industries.
Planar and Rotatable
Our sputtering targets are engineered to enhance performance and efficiency in thin film applications.
In House Indium Bonding
We offer tailored solutions to fit your specific needs, ensuring optimal results in every project.
C-Scan Guarantee
We offer tailored solutions to fit your specific needs, ensuring optimal results in every project.
Oxide & Ceramic Offering
A
- Aluminum Nitride (AlN) Sputtering Targets
- Aluminum Oxide (Al2O3) Sputtering Targets
- Antimony Telluride (Sb2Te3) Sputtering Targets
B
- Barium Cerium Yttrium Zirconate (BaCe(1-x-y)Y(x)Zr(y)O3) Sputtering Targets
- Barium Ferrite (BaFe12O19) Sputtering Targets
- Barium Fluoride (BaF2) Sputtering Targets
- Barium Strontium Titanate (Ba(1-x)Sr(x)TiO3) Sputtering Targets
- Barium Titanate (BaTiO3) Sputtering Targets
- Barium Zirconate (BaZrO3) Sputtering Targets
- Bismuth Calcium Ferrite (Bi0.9Ca0.1FeO3) Sputtering Targets
- Bismuth Ferrite (Bi3Fe5O12) Sputtering Targets
- Bismuth Oxide (Bi2O3) Sputtering Targets
- Bismuth Selenide (Bi2Se3) Sputtering Targets
- Bismuth Telluride (Bi2Te3) Sputtering Targets
- Bismuth Titanate (Bi4Ti3O12) Sputtering Targets
- Boron Carbide (B4C) Sputtering Targets
- Boron Nitride (BN) Sputtering Targets
C
- Cadmium Selenide (CdSe) Sputtering Targets
- Cadmium Sulfide (CdS) Sputtering Targets
- Cadmium Telluride (CdTe) Sputtering Targets
- Calcium Manganate (CaMnO3) Sputtering Targets
- Calcium Titanate (CaTiO3) Sputtering Targets
- Carbon (C (graphite)) Sputtering Targets
- Cerium Fluoride (CeF3) Sputtering Targets
- Cerium Oxide (CeO2) Sputtering Targets
- Chromium Oxide (Cr2O3) Sputtering Targets
- Chromium Silicide (CrSi2) Sputtering Targets
- Cobalt (Oxide (CoO) Sputtering Targets
- Cobalt Ferrite (CoFe2O4) Sputtering Targets
- Cobalt Oxide (CoO) Sputtering Targets
- Copper Oxide (CuO) Sputtering Targets
E
- Erbium Oxide (Er2O3) Sputtering Targets
- Europium Nickel Oxide (EuNiO3) Sputtering Targets
- Europium Titanate (EuTiO3) Sputtering Targets
G
- Gadolinium Cerium Oxide (Gd0.2Ce0.8O2) Sputtering Targets
- Gallium Oxide Doped Zinc Oxide (ZnO/Ga2O3 95/05 wt%) Target
- Germanium Antimony Telluride (Ge2Sb2Te5) Sputtering Targets
- Germanium Telluride (GeTe) Sputtering Targets
H
- Hafnium Carbide (HfC) Sputtering Targets
- Hafnium Nitride (HfN) Sputtering Targets
- Hafnium Oxide (HfO2) Sputtering Targets
I
- Indium Aluminum Zinc Oxide (In2O3/Al2O3/ZnO 65/16/19 wt%) Sputtering Targets
- Indium Gallium Zinc Oxide (InGaZnOx) Sputtering Targets
- Indium Iron Oxide (InFe2O4) Sputtering Targets
- Indium Molybdenum Oxide (In2O3/Mo 98/2 wt%) Sputtering Targets
- Indium Oxide (In2O3) Sputtering Targets
- Indium Tin Oxide (ITO (In2O3/SnO2 (90/10 wt%) Sputtering Targets
- Indium Zinc Oxide (IZO (In2O3/ZnO (90/10 wt%) Sputtering Targets
- Iron Oxide (Fe2O3) Sputtering Targets
L
- Lanthanum Aluminate (LaAlO3) Sputtering Targets
- Lanthanum Hexaboride (LaB6) Sputtering Targets
- Lanthanum Manganate (LaMnO3) Sputtering Targets
- Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets
- Lanthanum Strontium Manganate (La0.9Sr0.1MnO3) Sputtering Targets
- Lanthanum Titanate (La2Ti2O7) Sputtering Targets
- Lanthanum Vanadium Oxide Sputtering Targets
M
- Magnesium-doped Zinc Oxide – (Zn0.9Mg0.1O) Sputtering Targets
- Magnesium Fluoride (MgF2) Sputtering Targets
- Magnesium Oxide (MgO) Sputtering Targets
- Magnesium Silicide (Mg2Si) Sputtering Targets
- Manganese-doped Zinc Oxide – (ZnO with 0.3 wt% Mn) Sputtering Targets
- Manganese Oxide (MnO) Sputtering Targets
- Molybdenum Carbide (Mo2C) Sputtering Targets
- Molybdenum Disilicide (MoSi2) Sputtering Targets
- Molybdenum Disulfide (MoS2) Sputtering Targets
- Molybdenum Oxide (MoO3) Sputtering Targets
N
- Neodymium Aluminate (NdAlO3) Sputtering Targets
- Neodymium Copper Oxide (Nd2CuO4) Sputtering Targets
- Neodymium Nickel Oxide (NdNiO3) Sputtering Targets
- Nickel Ferrite (NiFe2O4) Sputtering Targets
- Nickel Oxide (NiO) Sputtering Targets
- Niobium Carbide (NbC) Sputtering Targets
- Niobium Nitride (NbN) Sputtering Targets
- Niobium Oxide (Nb2O5) Sputtering Targets
- Niobium Stannide (Nb3Sn) Sputtering Targets
P
- Praseodymium Calcium Manganate (Pr0.7Ca0.3MnO3) Sputtering Targets
S
- Samarium Oxide (Sm2O3) Sputtering Targets
- Scandia doped Zinc Oxide – (ZnO/Sc2O3 98/02 wt%) Sputtering Targets
- Silicon Carbide (SiC) Sputtering Targets
- Silicon Dioxide (SiO2 (Fused Quartz)) Sputtering Targets
- Silicon Monoxide (SiO) Sputtering Targets
- Silicon Nitride (Si3N4) Sputtering Targets
- Sodium Niobate (NaNbO3) Sputtering Targets
- Strontium Manganate (SrMnO3) Sputtering Targets
- Strontium Ruthanate (SrRuO3) Sputtering Targets
- Strontium Titanate (SrTiO3) Sputtering Targets
- Strontium Zirconate (SrZrO3) Sputtering Targets
T
- Tantalum Carbide (TaC) Sputtering Targets
- Tantalum Nitride (TaN) Sputtering Targets
- Tantalum Oxide (Ta2O5) Sputtering Targets
- Tantalum Silicide (TaSi2) Sputtering Targets
- Tin Oxide (SnO2) Sputtering Targets
- Titanium Boride (TiB2) Sputtering Targets
- Titanium Carbide (TiC) Sputtering Targets
- Titanium Dioxide (TiO2) Sputtering Targets
- Titanium Disilicide (TiSi2) Sputtering Targets
- Titanium Ferrite (TiFe2O4) Sputtering Targets
- Titanium Monoxide (TiO) Sputtering Targets
- Titanium Nitride (TiN) Sputtering Targets
- Tungsten Carbide (WC) Sputtering Targets
- Tungsten Disilicide (WSi2) Sputtering Targets
- Tungsten Disulfide (WS2) Sputtering Targets
- Tungsten Oxide (WO3) Sputtering Targets
V
- Vanadium Carbide (VC) Sputtering Targets
- Vanadium Oxide (V2O5) Sputtering Targets
Y
- Ytterbium Oxide (Yb2O3) Sputtering Targets
- Yttrium Ferrite (Y3Fe5O12) Sputtering Targets
- Yttrium Oxide (Y2O3) Sputtering Targets
- Yttrium Titanate (YTiO3) Sputtering Targets
Z
- Zinc Oxide (ZnO) Sputtering Targets
- Zinc Oxide Alumina – ZnO/Al2O3 Sputtering Targets
- Zinc Oxide doped with Gallium Oxide (ZnO/Ga2O3 95/05 wt%) Sputtering Targets
- Zinc Oxide doped with Magnesium (Zn0.9Mg0.1O) Sputtering Targets
- Zinc Oxide doped with Sodium (Zn0.99Na0.01O) Sputtering Targets
- Zinc Selenide (ZnSe) Sputtering Targets
- Zinc Sulfide (ZnS) Sputtering Targets
- Zinc Telluride (ZnTe) Sputtering Targets
- Zirconium Carbide (ZrC) Sputtering Targets
- Zirconium Nitride (ZrN) Sputtering Targets
- Zirconium Oxide (ZrO2 (fully stabilized – Y2O3)) Sputtering Targets
- Zirconium Oxide (ZrO2 (Partially stabilized ~5% Y2O3) Sputtering Targets