High-Purity Tantalum (Ta) Sputtering Targets for Superior Thin Film Deposition
Premium Tantalum Sputtering Targets for Precision Applications
Why Choose Our Tantalum Sputtering Targets?
• Exceptional Purity: Up to 99.95% purity ensures minimal contamination and consistent thin film quality.
•Custom Sizes and Shapes: Available in discs, plates, rods, or custom configurations to fit your specific needs.
• Stable Sputtering Performance: Ensures uniform thin film deposition for precise results.
• Broad Applications: From advanced microelectronics to medical devices, Tantalum targets meet the demands of diverse industries.
Applications of Tantalum Sputtering Targets
Benefits of Choosing SCI Engineered Materials for Tantalum Sputtering Targets
Technical Specifications: Tantalum
Tantalum (Ta) Metal
Tantalum is atomic number 73 and appears as a blue-gray, lustrous metal. Tantalum is incredibly corrosion-resistant & has been used as a replacement for platinum in some applications. The refinement of Tantalum is difficult because most of it is trapped in ores that contain niobium, which happens to have similar chemical properties to Tantalum. Highly bio-compatible, Tantalum composes many different implants and coatings on implants.
Tantalum (Ta) Sputtering Targets
We offer our Tantalum (Ta) Targets in 99.95% purity. You can add requests for our most common circular targets below which range in diameters from 1″ to 8″ round, and from 0.125″ Thick & 0.25″ Thick. If you’d like a quote on a standard or custom Tantalum (Ta) Sputtering Target please visit the quote forms below!
Standard Round Planar Quote Request
Custom Quote Request Form
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