Iridium (Ir) Sputtering Targets

For applications demanding the ultimate in stability and corrosion resistance, choose our high-purity Iridium (Ir) sputtering targets. As a platinum group metal with the highest known corrosion resistance and an exceptional melting point of , Iridium is indispensable for creating robust thin-film electrodes in next-generation DRAM/FRAM memory devices and high-reliability electrocatalysts. We supply ultra-dense targets that minimize arcing and ensure exceptional film uniformity for your most critical aerospace and electronics manufacturing processes.

Experience Unmatched Quality and Performance

Critical Iridium Applications in Memory and Hydrogen

Next-Generation Memory Electrodes

First of all, iridium thin film electrode layers are critical for advanced memory devices. Specifically, they serve as electrodes and barrier layers in DRAM and FRAM (Ferroelectric RAM) devices, offering the chemical stability and high work function needed to maintain performance in highly oxidizing fabrication environments.

(Referenced: Production of Iridium Metal Thin Films for Application as Electrodes in DRAMs and FRAMs)

Advanced Electronics

Furthermore, Iridium oxide electrocatalyst targets (IrO) are the state-of-the-art anode materials. Consequently, they are key components in the Oxygen Evolution Reaction (OER), enabling efficient hydrogen production in Proton Exchange Membrane (PEM) electrolyzers.

(Referenced: Research Progress on the Application of One-Step Fabrication Techniques for Iridium-Based Thin Films in the Oxygen Evolution Reaction)

Aerospace Coatings

Moreover, Iridium’s resistance to heat and erosion makes it the material of choice for high-temperature iridium coating systems. For example, it is used for lining rocket engine combustion chambers and coating catalyst beds in satellite thrusters.

(Referenced: Sputtered highly effective iridium catalysts: a new approach for green satellite propulsion)

Technical Information

Purity Melting Point Hardness Yield Strength/Tensile Available Geometries Backing Plate Options
99%-99.95% 1,907°C 8.5 20-154MPa
  • Planar
  • Rotatable

Planar:

  • Copper (Cu)
  • Molybdenum (Mo)

Rotatable:

  • Monolithic (Cr)

PGM Manufacturing Excellence and Custom Service

As a precious meta sputtering target supplier, we understand that quality and material stewardship are paramount. Our stringent quality control and advanced preparation techniques ensure that your target, whether planar or rotary, delivers exceptional results while maximizing the use of this rare PGM.

Target Bonding

We offer specialized Indium Bonding and high-temperature bonding services to ensure optimal thermal and electrical transfer between the Iridium and the backing plate, enhancing the stability and lifespan of the target.

Precious Metal Repress & Reclaim Services

Your investment in Platinum Group Metal Targets is protected by our material services. Our Precious Metal Sputtering program includes comprehensive reclaim and reprocessing to help you recover high-value Sputtering Target Material, minimizing waste and reducing your total cost of ownership.

Get Started with High-Purity Iridium

Contact us to learn more about how our high-quality Iridium Sputtering Targets can support your specific microelectronics application needs. Request a quote today!

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