Home » Solutions » Products » Sputtering Targets » Metal & Metal Alloy Sputtering Targets » Ruthenium (Ru) Sputtering Targets
Ruthenium (Ru) Sputtering Targets
Drive the future of microelectronics with our high-purity Ruthenium (Ru) sputtering targets. As a platinum group metal with a high melting point, excellent conductivity, and superior resistance to oxidation, Ruthenium is the crucial material for scaling down next-generation semiconductor devices. We provide ultra-dense targets (up to purity) that are essential for MRAM (Magnetic RAM) electrodes, advanced DRAM capacitors, and interconnect seed layers, ensuring maximum deposition stability and film uniformity for your most sensitive applications.
Experience Unmatched Quality and Performance
Key Features of Our Reclaim & Recycling Processes
Next-Gen Memory
THE material of choice for MRAM and DRAM electrodes due to its high conductivity and stability.
Diffusion & Interconnect
Functions as a robust diffusion barrier and
High Purity & Density
Targets up to purity with high theoretical density () for reduced particle generation.
About Our Manufacturing Excellence
Rely on our precision Ruthenium sputtering targets for high-volume, defect-free thin-film production. We specialize in high-density material preparation and tight impurity control, critical for creating highly uniform films in the data storage and advanced electronics sectors. Custom planar and rotary targets are available to optimize performance in your specific PVD system.
Our Specialized Services
Comprehensive Solutions for Your Needs
Indium Bonding
Our expert indium bonding service ensures optimal thermal and electrical conductivity for your sputtering targets, enhancing performance and longevity.
Custom Configurations
We offer tailored configurations to meet the specific requirements of your application, ensuring seamless integration and maximum efficiency.
Multi-Tile Assemblies
Our multi-tile assemblies are designed for both planar and rotary applications, providing versatility and adaptability for complex projects.
Rotary Target Manufacturing
Specializing in rotary target manufacturing, we deliver precision-engineered solutions that meet the highest industry standards.
Planar Target Solutions
Our planar target solutions are crafted with precision to support a wide range of thin film applications, ensuring superior performance.
Evaporative Materials
We supply high-quality evaporative materials that are essential for efficient thin film deposition processes across various industries.
Backing Plates and Tubes
Our durable backing plates and tubes are designed to support your sputtering targets, ensuring stability and reliability during operations.
Transparent Conductive Oxides
We develop advanced transparent conductive oxides like AZO and GZO, tailored for photovoltaic and display applications.
Get in Touch Today
Contact us to learn more about our high-quality Ruthenium (Ru) sputtering targets and how we can support your specific application needs. Request a quote today!