High-Purity Ceramic & Oxide Sputtering Targets for Advanced Thin-Films
Discover SCI Engineered Materials’ vast inventory of ceramic sputtering targets and compound deposition materials. Ultimately, these are indispensable for cutting-edge technologies worldwide. For example, our high-purity oxide sputtering media drive innovation in semiconductors, thin-film solar, large-area glass coating, and photonics. As a result, we manufacture targets up to 99.999% purity in both planar and rotatable geometries, ensuring maximum material utilization and film uniformity for your specific PVD application.
Critical Applications for Oxide and Ceramic Thin Films
We offer an unparalleled selection of advanced compound materials to support key technological advancements
-
Transparent Conductive Oxides (TCOs): First, we supply transparent conductive oxide targets like Indium Tin Oxide (ITO) and Aluminum-doped Zinc Oxide (AZO). Consequently, these ITO AZO deposition materials are vital for creating transparent electrodes in flat panel displays, touch screens, and high-efficiency photovoltaic cells. (Referenced:
)Transparent Conducting Oxide Films for Various Applications: A Review
-
High-K Dielectrics for Microelectronics: In addition, for next-generation microelectronics, we provide high-k dielectric thin film targets such as Hafnia (HfO2) and Zirconia (ZrO2). Furthermore, these hafnia zirconia sputtering materials are critical for reducing leakage current and enabling further scaling of DRAM and CMOS transistors. (Referenced:
)Emerging Applications for High K Materials in VLSI Technology
-
Optical & Specialty Coatings: We provide materials like TiO2, SiO2, and Al2O3. Specifically, these are used to create durable, high-refractive-index layers for sputtering targets for optics, photonics, and demanding aerospace sensor windows.
Target Manufacturing and Customized Service
Manufacturing ceramic targets to demanding specifications requires specialized techniques to control density and microstructure. Lastly, target uniformity and bonding integrity are paramount. This is why we guarantee material density and offer advanced testing methods like C-Scan analysis.
-
Rotary Target Solutions: We specialize in large rotary ceramic targets and assemblies. Therefore, we can meet the requirements of the high-volume, large area glass coating target assemblies market, including architectural glass and large thin-film solar arrays.
-
In-House Bonding: Also, we offer specialized in-house services, including Indium Bonding and high-temperature bonding. Specifically, our in-house Indium Bonding ensures optimal thermal and electrical conductivity, significantly enhancing target longevity and performance.
Planar and Rotatable
Our sputtering targets are engineered to enhance performance and efficiency in thin film applications.
In House Indium Bonding
We offer tailored solutions to fit your specific needs, ensuring optimal results in every project.
C-Scan Guarantee
We offer tailored solutions to fit your specific needs, ensuring optimal results in every project.
Ceramic & Oxide Offering
A
- Aluminum Nitride (AlN) Sputtering Targets
- Aluminum Oxide (Al2O3) Sputtering Targets
- Antimony Telluride (Sb2Te3) Sputtering Targets
B
- Barium Cerium Yttrium Zirconate (BaCe(1-x-y)Y(x)Zr(y)O3) Sputtering Targets
- Barium Ferrite (BaFe12O19) Sputtering Targets
- Barium Fluoride (BaF2) Sputtering Targets
- Barium Strontium Titanate (Ba(1-x)Sr(x)TiO3) Sputtering Targets
- Barium Titanate (BaTiO3) Sputtering Targets
- Barium Zirconate (BaZrO3) Sputtering Targets
- Bismuth Calcium Ferrite (Bi0.9Ca0.1FeO3) Sputtering Targets
- Bismuth Ferrite (Bi3Fe5O12) Sputtering Targets
- Bismuth Oxide (Bi2O3) Sputtering Targets
- Bismuth Selenide (Bi2Se3) Sputtering Targets
- Bismuth Telluride (Bi2Te3) Sputtering Targets
- Bismuth Titanate (Bi4Ti3O12) Sputtering Targets
- Boron Carbide (B4C) Sputtering Targets
- Boron Nitride (BN) Sputtering Targets
C
- Cadmium Selenide (CdSe) Sputtering Targets
- Cadmium Sulfide (CdS) Sputtering Targets
- Cadmium Telluride (CdTe) Sputtering Targets
- Calcium Manganate (CaMnO3) Sputtering Targets
- Calcium Titanate (CaTiO3) Sputtering Targets
- Carbon (C (graphite)) Sputtering Targets
- Cerium Fluoride (CeF3) Sputtering Targets
- Cerium Oxide (CeO2) Sputtering Targets
- Chromium Oxide (Cr2O3) Sputtering Targets
- Chromium Silicide (CrSi2) Sputtering Targets
- Cobalt (Oxide (CoO) Sputtering Targets
- Cobalt Ferrite (CoFe2O4) Sputtering Targets
- Cobalt Oxide (CoO) Sputtering Targets
- Copper Oxide (CuO) Sputtering Targets
E
- Erbium Oxide (Er2O3) Sputtering Targets
- Europium Nickel Oxide (EuNiO3) Sputtering Targets
- Europium Titanate (EuTiO3) Sputtering Targets
G
- Gadolinium Cerium Oxide (Gd0.2Ce0.8O2) Sputtering Targets
- Gallium Oxide Doped Zinc Oxide (ZnO/Ga2O3 95/05 wt%) Target
- Germanium Antimony Telluride (Ge2Sb2Te5) Sputtering Targets
- Germanium Telluride (GeTe) Sputtering Targets
H
- Hafnium Carbide (HfC) Sputtering Targets
- Hafnium Nitride (HfN) Sputtering Targets
- Hafnium Oxide (HfO2) Sputtering Targets
I
- Indium Aluminum Zinc Oxide (In2O3/Al2O3/ZnO 65/16/19 wt%) Sputtering Targets
- Indium Gallium Zinc Oxide (InGaZnOx) Sputtering Targets
- Indium Iron Oxide (InFe2O4) Sputtering Targets
- Indium Molybdenum Oxide (In2O3/Mo 98/2 wt%) Sputtering Targets
- Indium Oxide (In2O3) Sputtering Targets
- Indium Tin Oxide (ITO (In2O3/SnO2 (90/10 wt%) Sputtering Targets
- Indium Zinc Oxide (IZO (In2O3/ZnO (90/10 wt%) Sputtering Targets
- Iron Oxide (Fe2O3) Sputtering Targets
L
- Lanthanum Aluminate (LaAlO3) Sputtering Targets
- Lanthanum Hexaboride (LaB6) Sputtering Targets
- Lanthanum Manganate (LaMnO3) Sputtering Targets
- Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets
- Lanthanum Strontium Manganate (La0.9Sr0.1MnO3) Sputtering Targets
- Lanthanum Titanate (La2Ti2O7) Sputtering Targets
- Lanthanum Vanadium Oxide Sputtering Targets
M
- Magnesium-doped Zinc Oxide – (Zn0.9Mg0.1O) Sputtering Targets
- Magnesium Fluoride (MgF2) Sputtering Targets
- Magnesium Oxide (MgO) Sputtering Targets
- Magnesium Silicide (Mg2Si) Sputtering Targets
- Manganese-doped Zinc Oxide – (ZnO with 0.3 wt% Mn) Sputtering Targets
- Manganese Oxide (MnO) Sputtering Targets
- Molybdenum Carbide (Mo2C) Sputtering Targets
- Molybdenum Disilicide (MoSi2) Sputtering Targets
- Molybdenum Disulfide (MoS2) Sputtering Targets
- Molybdenum Oxide (MoO3) Sputtering Targets
N
- Neodymium Aluminate (NdAlO3) Sputtering Targets
- Neodymium Copper Oxide (Nd2CuO4) Sputtering Targets
- Neodymium Nickel Oxide (NdNiO3) Sputtering Targets
- Nickel Ferrite (NiFe2O4) Sputtering Targets
- Nickel Oxide (NiO) Sputtering Targets
- Niobium Carbide (NbC) Sputtering Targets
- Niobium Nitride (NbN) Sputtering Targets
- Niobium Oxide (Nb2O5) Sputtering Targets
- Niobium Stannide (Nb3Sn) Sputtering Targets
P
- Praseodymium Calcium Manganate (Pr0.7Ca0.3MnO3) Sputtering Targets
S
- Samarium Oxide (Sm2O3) Sputtering Targets
- Scandia doped Zinc Oxide – (ZnO/Sc2O3 98/02 wt%) Sputtering Targets
- Silicon Carbide (SiC) Sputtering Targets
- Silicon Dioxide (SiO2 (Fused Quartz)) Sputtering Targets
- Silicon Monoxide (SiO) Sputtering Targets
- Silicon Nitride (Si3N4) Sputtering Targets
- Sodium Niobate (NaNbO3) Sputtering Targets
- Strontium Manganate (SrMnO3) Sputtering Targets
- Strontium Ruthanate (SrRuO3) Sputtering Targets
- Strontium Titanate (SrTiO3) Sputtering Targets
- Strontium Zirconate (SrZrO3) Sputtering Targets
T
- Tantalum Carbide (TaC) Sputtering Targets
- Tantalum Nitride (TaN) Sputtering Targets
- Tantalum Oxide (Ta2O5) Sputtering Targets
- Tantalum Silicide (TaSi2) Sputtering Targets
- Tin Oxide (SnO2) Sputtering Targets
- Titanium Boride (TiB2) Sputtering Targets
- Titanium Carbide (TiC) Sputtering Targets
- Titanium Dioxide (TiO2) Sputtering Targets
- Titanium Disilicide (TiSi2) Sputtering Targets
- Titanium Ferrite (TiFe2O4) Sputtering Targets
- Titanium Monoxide (TiO) Sputtering Targets
- Titanium Nitride (TiN) Sputtering Targets
- Tungsten Carbide (WC) Sputtering Targets
- Tungsten Disilicide (WSi2) Sputtering Targets
- Tungsten Disulfide (WS2) Sputtering Targets
- Tungsten Oxide (WO3) Sputtering Targets
V
- Vanadium Carbide (VC) Sputtering Targets
- Vanadium Oxide (V2O5) Sputtering Targets
Y
- Ytterbium Oxide (Yb2O3) Sputtering Targets
- Yttrium Ferrite (Y3Fe5O12) Sputtering Targets
- Yttrium Oxide (Y2O3) Sputtering Targets
- Yttrium Titanate (YTiO3) Sputtering Targets
Z
- Zinc Oxide (ZnO) Sputtering Targets
- Zinc Oxide Alumina – ZnO/Al2O3 Sputtering Targets
- Zinc Oxide doped with Gallium Oxide (ZnO/Ga2O3 95/05 wt%) Sputtering Targets
- Zinc Oxide doped with Magnesium (Zn0.9Mg0.1O) Sputtering Targets
- Zinc Oxide doped with Sodium (Zn0.99Na0.01O) Sputtering Targets
- Zinc Selenide (ZnSe) Sputtering Targets
- Zinc Sulfide (ZnS) Sputtering Targets
- Zinc Telluride (ZnTe) Sputtering Targets
- Zirconium Carbide (ZrC) Sputtering Targets
- Zirconium Nitride (ZrN) Sputtering Targets
- Zirconium Oxide (ZrO2 (fully stabilized – Y2O3)) Sputtering Targets
- Zirconium Oxide (ZrO2 (Partially stabilized ~5% Y2O3) Sputtering Targets






