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3M™ 10B Enriched Boron Carbide Sputtering Targets
Address the critical shortage of with our specialized sputtering targets, the superior source material for advanced neutron detection systems. Utilizing Boron-10 () enriched material (isotopic purity ), our targets are essential for fabricating the thin-film converters in next-generation solid-state and microstructured neutron detectors. With an exceptional melting point and chemical purity, our dense targets ensure stable deposition and high-efficiency films for homeland security, scientific neutron scattering, and nuclear monitoring applications.
Experience Unmatched Quality and Performance
Key Features of Our Enriched Boron Carbide (10B4c) Sputtering Targets
Neutron Detection Core
Contains Boron-10 isotope, providing a high cross-section for thermal neutron absorption.
Solid-State Alternative
Replaces scarce in detectors for homeland security and scientific research (e.g., neutron scattering).
High Thermal Stability
Ultra-high melting point () targets ensure a consistent process for demanding semiconductor integration.
Technical Information
| Standard Composition | Purity | Hardness | Density | Yield Strength/Tensile | Available Geometries | Backing Plate Options |
| 10B4C |
99.5% B-10 Isotope >96 |
9.5-9.75 |
Observed: 2.37 g/cm³ ÷ Theoretical: 2.52 g/cm³ __________
94.04% |
260-375Mpa | Planar | Molybdenum (Mo) |
About Our Enriched Boron Carbide (10B4C) Sputtering Targets
Our precision targets are manufactured to a high theoretical density of to deliver reliable, highly uniform converter films. By minimizing impurities and maximizing the content, we provide the essential source material for manufacturing compact, efficient, and robust solid-state neutron detectors suitable for both research and commercial deployment.
Our Specialized Services
Comprehensive Solutions for Your Needs
Indium Bonding
Our expert indium bonding service ensures optimal thermal and electrical conductivity for your sputtering targets, enhancing performance and longevity.
Custom Configurations
We offer tailored configurations to meet the specific requirements of your application, ensuring seamless integration and maximum efficiency.
Multi-Tile Assemblies
Our multi-tile assemblies are designed for both planar and rotary applications, providing versatility and adaptability for complex projects.
Rotary Target Manufacturing
Specializing in rotary target manufacturing, we deliver precision-engineered solutions that meet the highest industry standards.
Planar Target Solutions
Our planar target solutions are crafted with precision to support a wide range of thin film applications, ensuring superior performance.
Evaporative Materials
We supply high-quality evaporative materials that are essential for efficient thin film deposition processes across various industries.
Backing Plates and Tubes
Our durable backing plates and tubes are designed to support your sputtering targets, ensuring stability and reliability during operations.
Transparent Conductive Oxides
We develop advanced transparent conductive oxides like AZO and GZO, tailored for photovoltaic and display applications.
Get in Touch Today
Contact us to learn more about our high-quality Enriched Boron Carbide (10B) sputtering targets and how we can support your specific application needs. Request a quote today!