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Barium Titanate (BaTiO3) Sputtering Targets
Power your next generation of memory and energy storage with our high-purity Barium Titanate () sputtering targets. As a cornerstone ceramic material renowned for its exceptional ferroelectric and high dielectric constant properties, is indispensable for advanced electronics. We provide targets with purity and superior density () that are essential for manufacturing high-density MLCC capacitors, non-volatile FeRAM (Ferroelectric RAM) devices, and precision piezoelectric sensors. Ensure stable deposition and superior electrical performance for your most demanding applications.
Experience Unmatched Quality and Performance
Key Features of Our Barium Titanate (BaTiO3) Sputtering Targets
Ferroelectric Core
Excellent ferroelectric properties ideal for non-volatile FeRAM and high-performance sensors.
High Dielectric Constant
Perfect for ultra-miniaturized, high-capacitance MLCC capacitors in modern electronics.
Thermal Stability
High melting point targets ensure stable PVD processing and uniform film deposition.
Technical Information
| Standard Composition | Purity | Hardness | Density | Bandgap | Available Geometries | Backing Plate Options |
| BaTiO3 | 99.90% | 5 |
Observed: 5.85 g/cm³ ÷ Theoretical: 6.02 g/cm³ __________
97.17% |
3.2eV |
Planar |
|
About Our Barium Titanate (BaTiO3) Sputtering Targets
For consistent electronic performance, choose our robust Barium Titanate (BaTiO3) sputtering targets. Our targets are manufactured to minimize pinholes and maximize density, ensuring a defect-free process critical for high-reliability non-volatile memory and piezoelectric components. We offer custom planar ceramic targets tailored to your system and demanding film thickness requirements.
Our Specialized Services
Comprehensive Solutions for Your Needs
Indium Bonding
Our expert indium bonding service ensures optimal thermal and electrical conductivity for your sputtering targets, enhancing performance and longevity.
Custom Configurations
We offer tailored configurations to meet the specific requirements of your application, ensuring seamless integration and maximum efficiency.
Multi-Tile Assemblies
Our multi-tile assemblies are designed for both planar and rotary applications, providing versatility and adaptability for complex projects.
Rotary Target Manufacturing
Specializing in rotary target manufacturing, we deliver precision-engineered solutions that meet the highest industry standards.
Planar Target Solutions
Our planar target solutions are crafted with precision to support a wide range of thin film applications, ensuring superior performance.
Evaporative Materials
We supply high-quality evaporative materials that are essential for efficient thin film deposition processes across various industries.
Backing Plates and Tubes
Our durable backing plates and tubes are designed to support your sputtering targets, ensuring stability and reliability during operations.
Transparent Conductive Oxides
We develop advanced transparent conductive oxides like AZO and GZO, tailored for photovoltaic and display applications.
Get in Touch Today
Contact us to learn more about our high-quality BaTiO3 sputtering targets and how we can support your specific application needs. Request a quote today!