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Tomorrow’s tech solutions…today!

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Metal Sputtering Targets

Aluminum (Al) Sputtering Targets

SCI Engineered Materials manufactures metal sputtering targets in basic metals to complex alloys in planar form and rotatable form. Our expertise in manufacturing precious metal targets like Gold (Au), Rhodium (Rh), Platinum (Pt), Iridium (Ir), Ruthenium (Ru), Silver (Ag) and Palladium (Pd), extends to rare metals like Hafnium (Hf), and more common ones like Aluminum (Al), Tin (Sn), Nickel (Ni) and Titanium. Not only does SCI manufactures sputtering targets in both planar and rotatable variations from these metals, but we also welcome custom & exotic alloy requests. Our engineers will work with you to find the manufacturing process for your evaporation & PVD materials that gives you the result you desire. We are also experts in bonding planar & rotatable targets to backing plates, and we proudly complete the entire process, from bonding to rigorous Quality Control, here in our facility in Columbus, Ohio.

Al (Aluminium)99%-99.999%Planar | Rotatable
Al (reflective)95%Planar
Cr (Chrome)99.5%-99.95% Planar | Rotatable
Cu (Copper)99.99%Planar | Rotatable
Mo (Molybdenum)99.95%Planar | Rotatable
Nb (Niobium)99.95%Planar | Rotatable
Ni (Nickel)99.99%Planar
NiCr (80/20 wt%)99.95%Planar | Rotatable
NiV (93/7 wt%)99.9%-99.95%Planar | Rotatable
Ru (Ruthenium)99.9%Planar
Ta (Tantalum)99.95%Planar
Ti (Titanium)99.2%-99.995%Planar | Rotatable
Zr (Zirconium)99.2%Planar | Rotatable
V (Vanadium)99.9%Planar
W (Tungsten)99.9%Planar