Sputtering Targets
SCI Engineered Materials™ provides Ceramic and Metal Sputtering targets for use in Sputtering and Laser Ablation including Cathodic Arc Sources, E-Beam and Pulsed Laser Deposition (PDL). Using our in-house forming and machining capability, we manufacture one-piece targets up to 20″ diameter or 14” square, tile arrays up to 3 meters, and rotary targets up to 4 meters. We also welcome custom or exotic ceramic and metal materials due to our ability to manufacture ceramic powders, and use our five vacuum hot presses to turn the raw material into a sputtering target. Depending on your sputtering system’s cathode design, we machine the material to your specifications. While some sputtering targets we manufacture don’t require a conductive bonded assembly, others that do can be Indium (In) bonded in house. We have a specialized quality control department that uses a C-Scan system for both rotatable and planar targets. SCI uses C-Scan systems to identify voids in each indium bond to eliminate issues with your PVD process.
Rotatable Indium Bonding Reclaim
If you have a rotatable indium bonded target assembly, with a target that is at its end of life, we can help you save money on a new indium bond! Indium (In) is an expensive metal. We take your old assembly, de-bond the used target, reclaim the indium, and pass the savings onto you for your new rotatable target assembly!
Please take a look at our Indium Bonding Data Sheet below for further information on our Indium Bonding Technology
Confidentiality:
We are committed to 100% customer satisfaction. To that end, our sales engineers want to work with you to select the appropriate target material, fabrication process, and bonding assembly that ensures the success of your thin film deposition process. Because your process information may be proprietary and the free exchange of information may be the only route to a solution, we routinely enter into non-disclosure agreements to protect both your and our proprietary process information.