High-Purity Sputtering Targets for PVD Thin Film Deposition
SCI Engineered Materials® is committed to an ongoing program of upgrading its technology to produce materials of the highest quality—especially our comprehensive range of high-purity sputtering targets. We understand that your thin-film deposition process demands materials with exceptional uniformity and consistency. Therefore, we leverage decades of expertise in advanced material science to deliver targets that optimize your process yield and performance. Because film quality is paramount, our commitment to purity and precise manufacturing is central to everything we do.
We are a full-service sputtering target manufacturer.
- Customization is Standard: Our expertise in in-house forming and precision machining allows us to create one-piece targets up to 20 inches in diameter, planar sputtering target tile arrays up to 3 meters, and rotary sputtering targets up to 4 meters.
- A Wide Range of Materials: We specialize in pure metal sputtering targets, complex alloys, and advanced ceramics. This diverse catalog supports virtually any Physical Vapor Deposition (PVD) application, from semiconductor fabrication to solar cell manufacturing.
- Advanced Target Bonding: To ensure optimal thermal and electrical conductivity, we use expert indium bonding services. This crucial step enhances your target’s performance and significantly extends its operational life.
Metal/Alloy Sputtering Targets
High-purity elemental metals and custom alloys (e.g., Al, Cu, Cr, W). Ideal for semiconductor, decorative, and magnetic applications.
High Purity Materials
Custom Configurations
Consistent Performance
Wide Application Range
Oxide/Ceramic Sputtering Targets
Advanced ceramic and oxide compositions (e.g., ITO, Alumina, TiO2. Essential for optical coatings, solar cells, and insulation layers.
Innovative Solutions
Enhanced Durability
Precision Engineering
Versatile Applications
Maximize Your Investment with Our Proprietary Recycling & Reclaim Processes
In addition to manufacturing new targets, SCI offers an industry-leading cost-reduction solution for high-value precious metal targets. The cost of noble-metal powder, combined with the low utilization of planar targets (often only 15%-30%), makes the target a major cost factor.
Consequently, our unique Virgin Powder Repress (VPR) process allows us to repurpose spent target backers by pressing in small portions of new, virgin powder. The result is a high-density target that does not inhibit the sputtering process. For example, depending on target geometry, a spent target backer can be successfully repressed up to ten times before the noble metal would need to be fully reclaimed, potentially leading to cost savings of up to 50% on noble metal powder.
Quality Assurance: Tested, Proven, Trusted Sputtering Targets
Our total manufacturing process is organized to ensure that materials travel through the facility efficiently, resulting in a streamlined work process and lower costs for you, the customer. We maintain stringent Quality Control (QC) protocols throughout the entire production cycle, backed by our ISO 9001:2015 certification. This certification is proof that our processes meet the highest international standards for consistency and quality management. You can find ours at the bottom of our website.
Before any product ships, our expert team performs specialized testing to verify purity, density, and dimensional accuracy. Finally, we ensure that your high-purity sputtering targets meet your specifications, eliminating potential issues in your PVD system.