Tungsten Disilicide (WSi2)

This Silicide of Tungsten has special applications in microelectronics where it is used as a “shunt” to increase the conductivity of polysilicon lines. Thin films of this material are non-stoichiometric and therefore must be annealed to create a conductive target for sputtering. WSi2 is being used as a replacement thin-film over tungsten due to its superior capabilities which include high thermal conductivity, and the ability to be plasma-etched.

Tungsten Disilicide (WSi2) Sputtering Targets

We offer our Tungsten Disilicide (WSi2) Targets in 99.85% purity. You can add requests for our most common circular targets below which range in diameters from 1″ to 8″ round, and from 0.125″ Thick & 0.25″ Thick.  If you’d like a quote on a custom Aluminum Nitride Sputtering Target please visit our custom request form to get exactly what you need!