Hafnium (Hf)
Basic Information
Purity: 99.99% (4N)
Color: Silver
Atomic Number: 45
| Planar | Rotatable |
Round Up To: 12″ Diameter | Multi-Tile Up to: 11″ (Segments) x 6.75″ OD Monolithic |
Square Up to: 12″ x 6.5″ x 0.75″ Thick | |
| Mu, Chi, Upsilon, Delta | OEM Configurations |
We offer our Hafnium (Hf) sputtering targets in planar variations. This high-refractive-index material can be E-Beam deposited, as well as sputtered. Hafnium can also be deposited as Hafnium Dioxide (HfO2) which has its own set of applications. Hafnium and HfO2 thin-films are used and studied in the cutting edge industries of DRAM (Dynamic Random Access-Memory), Fe-FET’s (Ferroelectric Field-Effect Transistors) & it could even be a novel gate dielectric gate in MOSFET (Metal Oxide Semiconductor Field Effect Transistor) circuits. Optical qualities include anti-reflection (AR), and its high thermal threshold also makes it useful in extreme temperature thermocouple probe insulators, as well as other Thermal Barrier Coatings (TBCs).
Technical Information
Vapor Pressure
| P (Pa) | 1 | 10 | 100 | 1 k | 10 k | 100 k |
| at T (K) | 2689 | 2954 | 3277 | 3679 | 4149 | 4876 |
| Melting Point | 2506 K (2233 °C, 4051 °F) |
| Boiling Point | 4876 K (4603 °C, 8317 °F) |
Density: (Solid) (Liquid) | 12.41 g/cm3 10.7 g/cm3 |
| Heat of Fusion | 26.59 kJ/mol |
| Heat of Vaporization | 493 kJ/mol |
