Hafnium
Density
13.3 g/cc
Color
Silver
Atomic Weight
178.49
We offer our Hafnium (Hf) sputtering targets in planar variations. This high-refractive-index material can be E-Beam deposited, as well as sputtered. Hafnium can also be deposited as Hafnium Dioxide (HfO2) which has its own set of applications. Hafnium and HfO2 thin-films are used and studied in the cutting edge industries of DRAM (Dynamic Random Access-Memory), Fe-FET’s (Ferroelectric Field-Effect Transistors) & it could even be a novel gate dielectric gate in MOSFET (Metal Oxide Semiconductor Field Effect Transistor) circuits. Optical qualities include anti-reflection (AR), and its high thermal threshold also makes it useful in extreme temperature thermocouple probe insulators, as well as other Thermal Barrier Coatings (TBC’s).
Data:
Atomic Number – 72
Melting Point – 2506 K
Boiling Point – 4876 K
Industries Served:
Optical
Semiconductor
Aerospace
Industrial
Optoelectronics
Available Forms:
Sputtering Targets
Evaporation Pieces
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Address & Contact
SCI Engineered Materials
2839 Charter Street
Columbus, Ohio, 43228
Phone: (614) 486-0261
Fax: (614) 486-0912
sales@sciengineeredmaterials.com