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Hafnium (Hf)

Basic Information

Purity: 99.99% (4N)

Color: Silver

Atomic Number: 45



Up To: 12″ Diameter


Up to: 11″ (Segments) x 6.75″ OD



Up to: 12″ x 6.5″ x 0.75″ Thick

Mu, Chi, Upsilon, DeltaOEM Configurations

We offer our Hafnium (Hf) sputtering targets in planar variations. This high-refractive-index material can be E-Beam deposited, as well as sputtered. Hafnium can also be deposited as Hafnium Dioxide (HfO2) which has its own set of applications. Hafnium and HfO2 thin-films are used and studied in the cutting edge industries of DRAM (Dynamic Random Access-Memory), Fe-FET’s (Ferroelectric Field-Effect Transistors) & it could even be a novel gate dielectric gate in MOSFET (Metal Oxide Semiconductor Field Effect Transistor) circuits. Optical qualities include anti-reflection (AR), and its high thermal threshold also makes it useful in extreme temperature thermocouple probe insulators, as well as other Thermal Barrier Coatings (TBCs). 

Technical Information

Vapor Pressure

P (Pa)1101001 k10 k100 k
at T (K)268929543277367941494876
Melting Point

2506 K

​(2233 °C, ​4051 °F)

Boiling Point

4876 K

​(4603 °C, ​8317 °F)




12.41 g/cm3

10.7 g/cm3

Heat of Fusion

26.59 kJ/mol

Heat of Vaporization

493 kJ/mol