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Aluminum Nitride (AlN) Sputtering Targets

SCI Engineered Materials™ offers Aluminum Nitride (AlN) Sputtering Targets in 99.8% purity. You can add requests for our most common circular targets below which range in diameter from 1″ to 8″ round, and from 0.125″ Thick & to 0.25″ Thick.  If you’d like a quote on custom Aluminum Nitride (AlN) Sputtering Targets please visit our custom request form to get exactly what you need!

Aluminum Nitride

This solid nitrate of aluminum is an excellent electrical insulator and has a high thermal conductivity considering it is an electrically insulating ceramic. Stable at high temperatures & resistant to most molten salts this material is synthesized by the carbothermal reduction of Aluminum Oxide (Al2O3) in a nitrogen or ammonia environment, or by the direct nitridation of the aluminum. Aluminum Nitride is commonly etched with a Chlorine Gas (Cl2) based reactive etch, and will dissolve in mineral acids slowly through grain boundary attack. Optically AlN is transparent in the ultraviolet and visible regions and can be used in various optical applications. In electronics, Aluminum Nitride is used as a heat sink, insulator, and even as the substrate for electronic circuits. SCI uses our hot presses to ensure a dense, technical-grade material for use in thin-film deposition.

To get an in-depth summary of the material, please visit the PubChem below:

PubChem Identifier: CID 3007857


Aluminum Nitride Sputtering Target
Aluminum Nitride (AlN) Sputtering Target












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