Aluminum Nitride (AlN) Sputtering Target
This solid nitrate of aluminum is an excellent electrical insulator and has a high thermal conductivity considering it is an electrically insulating ceramic. Stable at high temperatures & resistant to most molten salts this material is synthesized by the carbothermal reduction of Aluminum Oxide (Al2O3) in a nitrogen or ammonia environment, or by the direct nitridation of the aluminum. Aluminum Nitride is commonly etched with a Chlorine Gas (Cl2) based reactive etch, and will dissolve in mineral acids slowly through grain boundary attack. SCI uses our hot presses to ensure a dense, technical grade material for use in thin-film deposition.
Aluminum Nitride Sputtering Targets
We offer our Aluminum Nitride Targets in 99.8% purity. You can add requests for our most common circular targets below which range in diameters from 1″ to 8″ round, and from 0.125″ Thick & 0.25″ Thick. If you’d like a quote on a custom Aluminum Nitride Sputtering Target please visit our custom request form to get exactly what you need!