Hafnium Dioxide (HfO2) Sputtering Targets

Hafnium Dioxide (HfO2)

Hafnium Dioxide (HfO2), also known as Hafnia or Hafnium (IV) oxide, has various applications in the semiconductor industry. HfO2 is used in DRAM capacitors as well as field-effect transistors due to its high dielectric constant which is at least 4X greater than SiO2 which was previously used. Hafnium Dioxide also sees use in resistive-switching memories, SMOS-compatible FeFETs as well as memory chips.

Hafnium Dioxide (HfO2) Sputtering Targets

We offer our Hafnium Dioxide (HfO2) Targets in 99.9% purity. You can add requests for our most common circular targets below which range in diameters from 1″ to 8″ round, and from 0.125″ Thick & 0.25″ Thick.  If you’d like a quote on a custom Hafnium Dioxide (HfO2) Sputtering Target please visit our custom request form to get exactly what you need!