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Tantalum Nitride (TaN) Sputtering Targets

Tantalum Nitride (TaN)

Tantalum Nitride (TaN) sees use as a thin film in various microelectronic applications. Tantalum Nitride is used specifically as a bonding layer between conductive metals, and as a thin film resistor where it has the advantage of forming a passivation oxide layer that is resistant to moisture.

Tantalum Nitride (TaN) Sputtering Targets

We offer our Tantalum Nitride (TaN) Targets in 99.5% purity. You can add requests for our most common circular targets below which range in diameters from 1″ to 8″ round, and from 0.125″ Thick & 0.25″ Thick.  If you’d like a quote on a custom Tantalum Nitride (TaN) Sputtering Target please visit our custom request form to get exactly what you need!

 

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