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Tantalum Silicide (TaSi2) Sputtering Targets

Tantalum Silicide (TaSi2)

Tantalum Silicide (TaSi2) is used in ohmic contacts, connectors in integrated circuits, as well as witching devices. With a melting point of 2200 °C, TaSi2 has high thermal stability, along with low electrical resistance. It is also is resistant to oxidation in the air which makes ist a good pairing with silicon.

Tantalum Silicide (TaSi2) Sputtering Targets

We offer our Tantalum Silicide Targets in 99.5% purity. You can add requests for our most common circular targets below which range in diameters from 1″ to 8″ round, and from 0.125″ Thick & 0.25″ Thick.  If you’d like a quote on a custom Tantalum Silicide Sputtering Target please visit our custom request form to get exactly what you need!


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SCI Engineered Materials
2839 Charter Street
Columbus, Ohio, 43228

Phone: (614) 486-0261
Fax: (614) 486-0912