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Tungsten Disilicide (WSi2) Sputtering Targets

Tungsten Disilicide (WSi2)

This Silicide of Tungsten has special applications in microelectronics where it is used as a “shunt” to increase the conductivity of polysilicon lines. Thin films of this material are non-stoichiometric and therefore must be annealed to create a conductive target for sputtering. WSi2 is being used as a replacement thin-film over tungsten due to its superior capabilities which include high thermal conductivity, and the ability to be plasma-etched.

Tungsten Disilicide (WSi2) Sputtering Targets

We offer our Tungsten Disilicide (WSi2) Targets in 99.85% purity. You can add requests for our most common circular targets below which range in diameters from 1″ to 8″ round, and from 0.125″ Thick & 0.25″ Thick.  If you’d like a quote on a custom Aluminum Nitride Sputtering Target please visit our custom request form to get exactly what you need!

Add items to your quote request below.

No ordering or transactions will occur until an official order has been placed.

NQA_ISO9001_CMYK[1] (1)Small

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SCI Engineered Materials
2839 Charter Street
Columbus, Ohio, 43228

Phone: (614) 486-0261
Fax: (614) 486-0912
sales@sciengineeredmaterials.com