Hafnium Sputtering Targets for Thin Film Deposition

Our Hafnium sputtering targets are meticulously crafted to deliver exceptional performance in thin film deposition processes. From microelectronics to optical coatings, these high-purity targets are ideal for industries demanding reliable and consistent results.

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• High Purity Standards: With purity levels reaching 99.95% or higher, our Hafnium sputtering targets minimize impurities and optimize film quality.

• Custom Sizes and Shapes: Tailored to meet your project’s specific dimensions, including discs, plates, and rods.

• Uniform Sputtering Rates: Ensuring consistent thin film deposition for superior performance.

• Versatile Applications: Designed for use in semiconductors, optical devices, and R&D projects.

• Quick Lead Times: We prioritize your deadlines with fast and efficient order fulfillment.

• Global Shipping: Delivering Hafnium sputtering targets to customers worldwide.

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Hafnium (Hf) has a silvery-gray appearance. Due to its large neutron capture cross-section, it makes a great material for neutron absorption for applications like control rods in nuclear power plants.

Hafnium also plays a role in optics in the field of hydrogen sensing.

Hafnium (Hf) Sputtering Targets

We offer our Hafnium (Hf) metal targets in 99.9% purity. You can add requests for our most common circular targets below which range in diameter from 1″ to 8″ round, and from 0.125″ Thick to 0.25″ Thick.  Custom Hafnium (Hf) Sputtering Target quotes are available per quote request below.

Purity: 99.95% minimum

Shapes: Discs, plates, or rods (custom dimensions available)

Compatibility: Designed for use with standard sputtering systems